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GRH1802 Dry Claw Vacuum Pump 1800 m³/h High-Speed Oil-Free Vacuum Pump for Semiconductor Manufacturing

GRH1802 Dry Claw Vacuum Pump 1800 m³/h High-Speed Oil-Free Vacuum Pump for Semiconductor Manufacturing

제품 세부 정보:
원래 장소: 중국
브랜드 이름: Baosi
인증: CE
모델 번호: GRH1802
상세 정보
원래 장소:
중국
브랜드 이름:
Baosi
인증:
CE
모델 번호:
GRH1802
펌핑 속도:
1800m³/h
궁극의 압력:
≤0.5Pa
모터 파워:
7.5+4.5kW
전압:
380V/3상
입구:
ISO160
콘센트:
KF40
소음:
<70dB(A)
무게:
472kg
치수:
935×420×795mm
냉각수:
0.3-0.6MPa, 6L/분
N2 퍼지:
0.25-0.69MPa, 4-96L/분
강조하다:

High Light

강조하다:

high speed dry vacuum pump

,

1800m3h claw vacuum pump

,

semiconductor process vacuum pump

거래 정보
최소 주문 수량:
1세트
가격:
USD 9500-13500/Set
포장 세부 사항:
표준 목재 케이스 포장 수출
배달 시간:
15-30 영업일
지불 조건:
T/T,L/C
공급 능력:
50 세트/달
제품 설명

GRH1802 Dry Claw Vacuum Pump — 1800 m³/h Oil-Free Industrial Solution

The GRH1802 is a high-performance dry claw vacuum pump from the GRH series, delivering 1800 m³/h pumping speed with ultimate pressure ≤0.5 Pa. Its oil-free claw mechanism makes it ideal for semiconductor, photovoltaic, and lithium battery manufacturing processes that demand contamination-free vacuum environments.

Key Features

  • Oil-Free Claw Mechanism: No oil or working medium in pump chamber — ensures process cleanliness
  • Permanent Magnet Synchronous Motor: Superior energy efficiency for lower operating costs
  • Advanced Rotor Design: Enhanced dust exhaust capability for harsh process conditions
  • Dust & Vapor Insensitive: Handles dust and water vapor in pumped gases reliably
  • Compact & Integrated: Space-efficient design (935 * 420 * 795 mm, 472 kg)
  • Full Protection: Comprehensive protection with strong adaptive control
  • Low Vibration & Noise: Below 70 dB(A) at ultimate pressure
  • Advanced Sealing System: Lip seal + labyrinth seal + nitrogen purge for oil-free vacuum
  • Remote Monitoring: I/O and RS485 (Modbus) interface for remote control

Technical Specifications

ModelGRH1802
Pumping Speed1800 m³/h
Ultimate Pressure≤0.5 Pa
Motor Power7.5 + 4.5 kW
Voltage380V (3-Phase)
Inlet ConnectionISO160
Outlet ConnectionKF40
Noise Level<70 dB(A)
Weight472 kg
Dimensions (L*W*H)935 * 420 * 795 mm
Cooling Water Pressure0.3–0.6 MPa
Cooling Water Flow6 L/min
N₂ Purge Pressure0.25–0.69 MPa
N₂ Purge Flow4–96 L/min
Operating Temperature5–40°C; ≤80% RH

Applications

  • Semiconductor: Etch, Ion Implantation, CVD (ALD, PECVD, MOCVD, SACVD, RTP, HDP-CVD)
  • Photovoltaic: Crystal growth furnaces, solar cell fabrication
  • Lithium Battery: Cell vacuum drying, electrolyte filling, degassing